Molecular Vista Announces Vista 300
2024年7月25日 - 8:20PM
ビジネスワイヤ(英語)
Molecular Vista Inc. (MVI), a company specializing in
nano-chemical metrology, is pleased to announce Vista 300 – a nano
IR instrument targeted for advanced semiconductor process
monitoring and defect analysis.
This press release features multimedia. View
the full release here:
https://www.businesswire.com/news/home/20240724467807/en/
Vista 300. A photo of the complete
instrument along with a close-up. Vista 300 can accommodate wafers
up to 300 mm. (Graphic: Business Wire)
Vista 300 combines an atomic force microscope with infrared
spectroscopy to provide Photo-induced Force Microscopy (PiFM), a
technique that performs chemical mapping with a spatial resolution
of <5 nm, which is far superior to competing analytical methods
like TOF-SIMS or XPS. PiFM provides chemical maps of compounds and
molecular materials similar to how EDX performs elemental mapping
at the nanoscale. While STEM-EDX has resolution similar to PiFM, it
can only see atomic species. PiFM, however, maps and identifies
molecules, be they organic or polymeric contaminants, inorganic
particles or nanostructures, or EUV resist films and residues. PiFM
is a noncontact technique, so samples remain clean, making PiFM
ideal for analyzing surface functionalization (even down to
monolayers) or identifying nanoscale defects and particles.
A remarkable demonstration of PiFM is shown in the accompanying
images – PiFM is able to map the chemical differences between
exposed and unexposed 16 nm half-pitch patterns in EUV resist
before the resist is developed. AFM topography reveals no hint of
the exposed pattern, but PiFM detects the chemical changes caused
by EUV exposure. For more information on this relatively new
analytical technique, visit molecularvista.com.
Vista 300 is designed to handle full 300 mm wafers but does so
in a minimal footprint of only 1.1 x 1.1 m2. The tool is fully
developed and ready for immediate orders. Demonstrations of Vista
300 on customer wafers or other sample are available by contacting
MVI through the company website.
In 2015, MVI was the first company to demonstrate <10nm
resolution with nano IR (beating the competition by 10X at the
time) and continues to lead the industry today with the
introduction of new automation features that make PiFM easier than
ever. MVI’s new AutoPiFM capability identifies materials and
generates chemical maps and chemical fingerprint spectra with
minimal user input required. Sit back and let AutoPiFM do the work!
Likewise, MVI’s new AutoAlign system automatically and
optimally focuses the IR optical beam on the AFM tip, eliminating
the need for the user to learn the details of optical alignment.
These features make PiFM fully accessible to laboratory or
production technicians.
“With more advanced semiconductor processes dependent on
atomically thin organic and dielectric layers with increasingly
smaller feature sizes,” said Dr. Sung Park, CEO of Molecular Vista,
“Vista 300 is a perfect hybrid topography and chemical metrology
tool for characterizing High NA EUV lithography, selective atomic
layer deposition, Cu-Cu hybrid bonding processes, and sub-100 nm
defects.”
View source
version on businesswire.com: https://www.businesswire.com/news/home/20240724467807/en/
Molecular Vista (408) 915-2595 info@molecularvista.com