IBM Technology Alliance Announces Availability of Advanced 28-Nanometer, Low-Power Semiconductor Technology
2009年4月16日 - 7:00PM
PRニュース・ワイアー (英語)
IBM, Chartered, GLOBALFOUNDRIES, Infineon, Samsung and
STMicroelectronics Expand Technology Agreements EAST FISHKILL,
N.Y., April 16 /PRNewswire-FirstCall/ -- In a move that signals a
firm and ongoing commitment to advanced semiconductor technology
leadership, IBM (NYSE:IBM), Chartered Semiconductor Manufacturing
Ltd. (NASDAQ:CHRTNASDAQ:andNASDAQ:SGX-ST:NASDAQ:Chartered),
GLOBALFOUNDRIES, Infineon Technologies (FSE/NYSE: IFX), Samsung
Electronics, Co., Ltd., and STMicroelectronics (NYSE: STM) have
defined and are jointly developing a 28-nanometer (nm), high-k
metal gate (HKMG), low-power bulk complementary metal oxide
semiconductor (CMOS) process technology. (Logo:
http://www.newscom.com/cgi-bin/prnh/20090416/IBMLOGO) The
low-power, 28nm technology platform can provide power-performance
and time-to-market advantages for producers of a broad range of
power-sensitive mobile and consumer electronics applications,
including the fast-growing mobile Internet device market segment.
The favorable leakage characteristics of the HKMG technology result
in optimized battery life for the next generation of mobile
products. This announcement represents an extension of existing
joint development agreements, and further progression in the
technology offerings of the alliance partners, building on the
success of earlier joint development work in 32nm HKMG technology.
A 28nm low-power technology evaluation kit was previously made
available in December 2008 to early access clients, followed by
release in March 2009 of an evaluation kit for open access to the
general marketplace. Early risk production is anticipated in the
second half of 2010. Already working with clients on 32nm low-power
technology, the alliance has gained valuable experience in the
implementation of HKMG technology, and is offering a migration path
from 32nm to 28nm technology. Clients can begin their designs today
in leadership 32nm HKMG technology and then transition to 28nm
technology for density and power advantages, without the need for a
major redesign. By assuring a path from 32nm to 28nm technology,
this migration methodology offers clients lower risk, reduced cost
and faster time-to-market. "Through this collaboration, IBM and its
alliance partners are helping to accelerate development of
next-generation technology to achieve high-performance,
energy-efficient chips at the 28nm process level, maintaining our
focus on technology leadership for our clients and partners," said
Gary Patton, vice president for IBM's Semiconductor Research and
Development Center on behalf of the technology alliance.
Preliminary results working with early access clients and partners
indicate that the 28nm technology platform can provide a 40 percent
performance improvement and a more than 20 percent reduction in
power -- all in a chip that is half the size -- compared with 45nm
technology. The high-k metal gate implementation allows one of the
industry's smallest SRAM cells at 0.120 square microns, with low
minimum voltage operation and competitive performance, leakage and
stability. These improvements enable microchip designs with
outstanding performance, smaller feature sizes and low standby
power, contributing to faster processing speed and longer battery
life in next-generation mobile Internet devices and other systems.
"This statement of commitment to 28nm low-power technology by the
IBM Joint Development Alliance is an important progression from
32nm high-k metal gate technology," said Jorgen Lantto, chief
technology officer of ST-Ericsson. "Leaders in the mobile industry
can utilize 28nm low-power technology to meet the increasingly
aggressive demands for performance and improved battery life."
"28nm low-power technology will provide a significant step function
in terms of performance, consumption and density versus the 40nm
node, enabling competitive solutions for consumer and automotive
segments served by STMicroelectronics," said Jean-Marc Chery,
executive vice president, chief technology officer of
STMicroelectronics. In September 2008, ARM and the Common Platform
alliance (IBM, Chartered and Samsung) announced a collaboration
agreement to develop a comprehensive 32nm and 28nm
Systems-on-a-Chip design platform. The first milestone from this
collaboration was the announcement of the ARM Cortex processor in
Common Platform 32nm HKMG technology at the Mobile World Congress
in February. "Through industry collaboration and integration of our
processor and physical IP with advanced manufacturing technologies,
ARM and the Common Platform alliance continue to drive the adoption
of next-generation consumer electronics," said Simon Segars,
executive vice president and general manager, physical IP division,
ARM. "We believe this announcement is a significant advancement of
the HKMG technology to enable our customers' aggressive product
designs while accelerating their time to market." Unlike poly/SiON,
the HKMG low-power technology breaks down the historical barrier of
scaling, allowing significant power and performance advantage
without the need for complex processes, thereby lowering clients'
total development cost. Today's announcement marks the latest
development achievement from this alliance of semiconductor
manufacturing, development and technology companies who collaborate
to address the product design and advanced process development
challenges central to producing a smaller, faster, more cost
efficient generation of semiconductors. Chartered Semiconductor
Manufacturing Tiffany Sparks 408-941-1185 GLOBALFOUNDRIES Jon
Carvill 512-602-8162 Infineon Technologies Mitchel Ahiers
408-503-2791 IBM Jeff Couture 802-769-2483 Samsung Electronics Lisa
Warren-Plungy 408-544-5377 STMicroelectronics Michael Markowitz
781-449-0354 http://www.newscom.com/cgi-bin/prnh/20090416/IBMLOGO
http://photoarchive.ap.org/ DATASOURCE: IBM Corporation CONTACT:
Chartered Semiconductor Manufacturing, Tiffany Sparks,
+1-408-941-1185, ; or GLOBALFOUNDRIES, Jon Carvill,
+1-512-602-8162, ; or Infineon Technologies, Mitchel Ahiers,
+1-408-503-2791, ; or IBM, Jeff Couture, +1-802-769-2483, ; or
Samsung Electronics, Lisa Warren-Plungy, +1-408-544-5377, ; or
STMicroelectronics, Michael Markowitz, +1-781-449-0354, Web Site:
http://www.ibm.com/
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